Tao Hang

机构：Shanghai Jiao Tong University · ORCID：0000-0001-6902-0788

发表论文 188 篇 · 总被引 4198 次 · h-index 32

代表论文

• First-principles insight into the pH-dependency of the corrosion inhibition ability of benzotriazole and 1,2,4-triazole for copper in chemical mechanical polishing slurry (2024 · Corrosion Science · 被引 37)
• Rational utilization of the size and electronic effect of inhibitors enabling high polishing rate with minimum corrosion in copper chemical mechanical polishing (2024 · Applied Surface Science · 被引 18)
• Abnormal grain growth of (110)-oriented perpendicular nanotwinned copper into ultra-large grains at low temperatures (2024 · Journal of Material Science and Technology · 被引 18)
• A design of green slurry for copper/cobalt barrier-step chemical mechanical polishing with controlled removal selectivity and dynamic galvanic corrosion inhibition (2024 · Surfaces and Interfaces · 被引 15)
• Ablation resistance and current-carrying friction performance of WMoCu alloy with different Mo contents (2024 · Tribology International · 被引 12)
• Controlled corrosion behaviors of copper in oxidizer solutions for chemical mechanical polishing: Influence of the decomposition products (2024 · Corrosion Science · 被引 10)