Controlled corrosion behaviors of copper in oxidizer solutions for chemical mechanical polishing: Influence of the decomposition products

作者：Pengfei Chang, Zisheng Huang, Yulong Chen, Huiqin Ling, Yunwen Wu, Ming Li, Tao Hang · 发表于：Corrosion Science · 年份：2024 · DOI：10.1016/j.corsci.2024.112352 · 被引用次数：9 · 研究领域：Advanced Surface Polishing Techniques、Corrosion Behavior and Inhibition、Metal and Thin Film Mechanics