Review of physicochemical-assisted nanomanufacturing processes for wide-bandgap semiconductor wafers

作者：Kazuya Yamamura, Hui Deng, Yasuhisa Sano, Junji Murata, Xu Yang, Rongyan Sun · 发表于：International Journal of Machine Tools and Manufacture · 年份：2025 · DOI：10.1016/j.ijmachtools.2025.104321 · 被引用次数：12 · 研究领域：Ion-surface interactions and analysis、Integrated Circuits and Semiconductor Failure Analysis、Advanced Surface Polishing Techniques