Microwave plasma modification-assisted shear-thickening polishing of single-crystal silicon carbide

作者：Mingjie Shen, Min Wei, Lingwei Wu, Binbin Hong, Jiahao Ye, Hongyu Chen, Julong Yuan, Binghai Lyu, Chuansheng Wang, Hui Deng, Wei Hang · 发表于：Precision Engineering · 年份：2025 · DOI：10.1016/j.precisioneng.2025.02.010 · 被引用次数：21 · 研究领域：Advanced Surface Polishing Techniques、Diamond and Carbon-based Materials Research、Metal and Thin Film Mechanics