High-efficiency free-damage electrochemical shear-thickening polishing of single-crystal silicon carbide

作者：Mingjie Shen, Lingwei Wu, Min Wei, Hongyu Chen, Julong Yuan, Binghai Lyu, Hui Deng, Suet To, Tufa Habtamu Beri, Wei Hang · 发表于：Journal of Manufacturing Processes · 年份：2024 · DOI：10.1016/j.jmapro.2024.10.053 · 被引用次数：41 · 研究领域：Advanced Surface Polishing Techniques、Integrated Circuits and Semiconductor Failure Analysis、Diamond and Carbon-based Materials Research