Substrate temperature effects on PEALD HfAlO dielectric films for IGZO-TFT applications

作者：Hanbin Chen, Chia‐Hsun Hsu, Wan-Yu Wu, Wenzhi Zhang, Jing Zhang, Xiaoying Zhang, Peng Gao, Dong‐Sing Wuu, Feng‐Min Lai, Shui‐Yang Lien, Wen‐Zhang Zhu · 发表于：Applied Surface Science · 年份：2024 · DOI：10.1016/j.apsusc.2024.160305 · 被引用次数：11 · 研究领域：Semiconductor materials and devices、Ferroelectric and Negative Capacitance Devices、Thin-Film Transistor Technologies