Improving Ruthenium Electrodeposition for Interconnect Applications through Substrate and Mass-Transport Control

作者：ZHITAO HU, ZHITAO HU, Wending Hou, Wending Hou, Tomoyuki Kurioka, Tomoyuki Kurioka, 元 彦坂, Gen Hikosaka, Tso-Fu Mark Chang, Tso-Fu Mark Chang, Katsuyuki Machida, Katsuyuki Machida, Hiroyuki Ito, Hiroyuki Ito, Y MIYAKE, Y MIYAKE, 正人 曽根, Masato Sone · 发表于：Institutional Repositories DataBase (IRDB) · 年份：2026 · 研究领域：Materials science、Nanotechnology、Optoelectronics、Chemical engineering