Atomic-scale study on nanoparticle removal mechanism during post-Cu CMP cleaning process using ReaxFF MD

作者：Lifei Zhang, Qinyang Zeng, Yating Huang, Dewen Zhao, Yongquan Xiao, Zhengyi Fu · 发表于：Applied Surface Science · 年份：2025 · DOI：10.1016/j.apsusc.2025.164864 · 被引用次数：2 · 研究领域：Advanced Surface Polishing Techniques、Nanofabrication and Lithography Techniques、Diamond and Carbon-based Materials Research