Surface stability of CuBr thin films deposited by pulsed laser deposition

作者：Ștefan Andrei Irimiciuc, Petr Pokorný, Sergii Chertopalov, Martin Vondráček, Stanislav Cichoň, Lenka Volfova-Lebedova, Eva Marešová, Roman Yatskiv, Michal Novotný, J. Lančok · 发表于：Applied Surface Science · 年份：2025 · DOI：10.1016/j.apsusc.2025.164813 · 被引用次数：1 · 研究领域：ZnO doping and properties、Copper-based nanomaterials and applications、Electronic and Structural Properties of Oxides

• Optimization of CuBr thin film growth by pulsed laser deposition. • Surface stability analysis by comprehensive XPS, TDS and TSEE measurements. • Oxide induced defects and activation energy assessment. • Surface degradation via oxide and hydroxide formation. CuBr thin films were deposited by pulsed laser deposition under various growth conditions of substrate temperature and Ar pressure. The growth kinetics, coupled with the high energy of the particles during deposition, led to the formation of a secondary Cu phase inside the films at temperatures lower than the stability limit of the CuBr phase. The increase in Ar pressure during deposition led to surface roughness and the formation of particulates on the CuBr films. XPS and optical transmission spectroscopy revealed the presence of fractional Cu 2 O and Cu phases on the CuBr surface, which indicates strong contamination from the ambient environment and surface instability to oxygen. Further in-depth analysis of the surface stability and disintegration due to oxidation was performed surface process investigations via thermally stimulated desorption and thermally stimulated exo -electron emission.