Scalable Wafer-Level Fabrication of Slanted TiO 2 Gratings for Directional Visible Light Control

作者：Xiang Gao, Shuo Dong, Xiaolong Wang, Tong‐Huai Cheng, Shixin Sun, Muhan Tang, Kaidong Xu, Feng Luo · 发表于：Nano Letters · 年份：2025 · DOI：10.1021/acs.nanolett.5c04104 · 被引用次数：2 · 研究领域：Optical Coatings and Gratings、Optical Wireless Communication Technologies、Photonic Crystals and Applications

Slanted TiO 2 gratings serve as key couplers enabling high-efficiency, large-angle diffraction in augmented reality (AR) diffractive optical waveguide systems, thereby supporting compact and transparent display integration. However, fabrication challenges and high production costs have hindered their scalability. Here, we demonstrate a streamlined and high-fidelity pattern transfer framework, integrating interference lithography, nanoimprint lithography, inductively coupled plasma etching, and reactive ion beam etching. This framework enables one-step pattern replication and precise angular control across wafer-scale areas. An experimental demonstration of the slanted TiO 2 grating confirms high structural fidelity and effective phase modulation, enabling efficient directional light steering toward desired diffraction orders. Our work offers a practical and scalable fabrication strategy for implementing slanted TiO 2 gratings in AR systems, advancing their feasibility for large-scale integration and commercial deployment.