Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices

作者：Rui Liu, Esteban Pedrueza‐Villalmanzo, Aldo Jesorka · 发表于：Scientific Reports · 年份：2025 · DOI：10.1038/s41598-025-19744-7 · 被引用次数：2 · 研究领域：Microfluidic and Capillary Electrophoresis Applications、Innovative Microfluidic and Catalytic Techniques Innovation、Electrowetting and Microfluidic Technologies

We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.