Understanding the growth of refractory high-entropy alloys by magnetron sputtering via in situ plasma diagnostics

作者：Ștefan Andrei Irimiciuc, Petr Hruška, Stanislav Cichoň, Martin Vondráček, Ladislav Fekete, František Lukáč, J. Lančok · 发表于：Surface and Coatings Technology · 年份：2025 · DOI：10.1016/j.surfcoat.2025.132610 · 被引用次数：3 · 研究领域：High Entropy Alloys Studies、High-Temperature Coating Behaviors、Additive Manufacturing Materials and Processes

The growth of equimolar and non-equimolar HfNbTiVZr thin films deposited by DC magnetron sputtering deposition is investigated by in situ real time plasma monitoring with various surface analysis techniques. Plasma monitoring via optical emission spectroscopy revealed that low-energy deposition conditions led to an amorphous film under low-temperature deposition conditions. The equimolar system is sensitive to Ti losses during deposition, whereas the off-stochiometric case has significant V and Zr losses in the plasma phase at high Ar pressures. Crystallinity was induced in the HfNbTiVZr equimolar films by postdeposition annealing at 750 °C, whereas Hf0.75Nb0.75TiV1.25Zr1.25 maintained its amorphous state due to the larger δ parameter. By combining in situ monitoring of the deposition process through optical emission spectroscopy with X-ray photoelectron spectroscopy analysis of amorphous and crystalline films, it was confirmed that the oxidation was generated by chemical interactions with the ambient environment, to which the amorphous state was more susceptible to oxidation.