High atomic oxygen erosion resistance of MoS2-based films by dynamic redox mechanism of CeO2

作者：Shifan Ju, Ji Li, Xiaohong Liu, Xiaoqin Zhao, Huidi Zhou, Jianmin Chen, Hongxuan Li, Junshuai Li · 发表于：Tribology International · 年份：2025 · DOI：10.1016/j.triboint.2025.111046 · 被引用次数：5 · 研究领域：Metal and Thin Film Mechanics、Diamond and Carbon-based Materials Research、Fuel Cells and Related Materials