First-principles insights into the synergistic chemical–mechanical removal mechanism of 4H-SiC in chemical mechanical polishing

作者：Changqi Xu, Xin Song, Li Ning, Yan Su, Renke Kang, Shang Gao · 发表于：Applied Surface Science · 年份：2025 · DOI：10.1016/j.apsusc.2025.163991 · 被引用次数：15 · 研究领域：Silicon Carbide Semiconductor Technologies、Advanced Surface Polishing Techniques、Advanced ceramic materials synthesis