Constructing abundant 5d electron buffering interfaces for enhancing acidic water oxidation

作者：Jingqiu Shang, Xiuxiu Zhang, Youcai Che, Xupeng Qin, Yuhao Zhang, Jing Zhang, Baojie Li, Chenyu Yang, Yaling Jiang, Xiangang Lin, Qinghua Liu · 发表于：Journal of Materials Chemistry A · 年份：2025 · DOI：10.1039/d5ta03724g · 被引用次数：4 · 研究领域：Electrocatalysts for Energy Conversion、Semiconductor materials and devices、Catalytic Processes in Materials Science

Through metal–support interactions to modulate the electronic structure of Ru active sites, a Ru/Ta 2 O 5 ( v ) catalyst with abundant 5d electron buffering interfaces was fabricated to balance the trade-off between catalytic activity and stability.