The viscoelastic dynamic model for profile evolution of photoresist formed during thermal reflow

作者：Lin Xi, Qi Li, Yufan Yang, Yan Xing, Xiaohui Lin, Chibin Zhang, Qing Chai · 发表于：Journal of Non-Newtonian Fluid Mechanics · 年份：2025 · DOI：10.1016/j.jnnfm.2025.105439 · 被引用次数：2 · 研究领域：Fluid Dynamics and Thin Films、Nanofabrication and Lithography Techniques、Laser Material Processing Techniques