Microstructure and Electrical Properties of Scandium-Doped Aluminum Nitride Thin Film

作者：Jiaqiang Chen, Junxi Zhang, Zhiyang Fan, Ping Yu · 发表于：Coatings · 年份：2025 · DOI：10.3390/coatings15050549 · 被引用次数：5 · 研究领域：Acoustic Wave Resonator Technologies、GaN-based semiconductor devices and materials、Metal and Thin Film Mechanics

Highly (0002)-oriented Al1−xScxN thin films with different Sc doping concentrations (x = 0, 0.2, 0.25, 0.3, and 0.43) were prepared via a magnetron sputtering system. The effects of Sc doping on the crystal structure and electrical property of the as-prepared thin films were investigated experimentally. The results of synchrotron radiation grazing-incidence wide-angle X-ray scattering (GIWAXS) and X-ray diffraction (XRD) demonstrated that the Sc3+ substitution for Al3+ induced asymmetric lattice distortion: the a-axis exhibited monotonic expansion (reaching 3.46 Å at x = 0.43) due to the larger atomic radius of Sc (~0.87 Å), while the c-axis attained a maximum value of 5.14 Å at x = 0.2 and subsequently contracted as the bond angle reduction became dominant. The dielectric constant increased to 34.67 (225% enhancement) at x = 0.43, attributed to the enhanced polarization of Sc-N bonds and interfacial charge accumulation effects. Simultaneously, the dielectric loss increased from 0.15% (x = 0) to 6.7% (x = 0.43). Leakage current studies revealed that high Sc doping (x = 0.43) elevated the leakage current density to 10−6 A/cm2 under an electric field of 0.2 MV/cm, accompanied by a transition from Ohmic conduction to space-charge-limited current (SCLC) at a low electric field strength (<0.072 MV/cm).