Cavity-based compact light source for extreme ultraviolet lithography

作者：Chun He, Hanxiang Yang, Nanshun Huang, Bo Liu, Haixiao Deng · 发表于：Physical Review Accelerators and Beams · 年份：2025 · DOI：10.1103/physrevaccelbeams.28.030702 · 被引用次数：7 · 研究领域：Particle Accelerators and Free-Electron Lasers、Advancements in Photolithography Techniques、Advanced X-ray Imaging Techniques

A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this field. However, current LPP light sources may provide insufficient average power to enable future manufacturing at the 3 nm node and below. In this context, accelerator-based light sources are considered to be promising tools for EUV lithography. This paper proposes a regenerative amplifier free-electron laser EUV source with harmonic lasing, driven by a superconducting energy-recovery linac (ERL). By utilizing the n th harmonic, the required electron beam energy is reduced to 1 / n of that in conventional schemes. The proposed configuration, employing an electron beam energy of approximately 0.33 GeV with a short-period (16 mm) undulator, is estimated to provide an average EUV power of about 2 kW. This approach significantly reduces the required electron energy and facility size relative to other accelerator-based proposals, thereby offering new possibilities for constructing high-power EUV sources with low-energy ERLs.