Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating

作者：Wenhao Li, X.M. Wang, Bayanheshig Bayanheshig, Zhaowu Liu, Wei Wang, Shan Jiang, Yubo Li, Shuo Li, Wei Zhang, Yanxiu Jiang, Wu Zheng, Wenyuan Zhou · 发表于：Light Science & Applications · 年份：2025 · DOI：10.1038/s41377-025-01785-2 · 被引用次数：45 · 研究领域：Optical Coatings and Gratings、Advanced Optical Imaging Technologies、Adaptive optics and wavefront sensing

The scanning interference field exposure technique is an effective method to fabricate holographic diffraction grating with meter-level size and nano-level precision. The main problems of fabricating large-aperture and high-precision grating by this technique are the high-precision displacement measurement of the stage, the high-precision control of the interference fringe and the real time compensation of the grating phase error. In this paper, the influence of grating groove error on the wavefront aberration is analyzed. In order to improve the precision of the stage with displacement range more than one meter, an integrated displacement measurement combining grating sensing and laser interferometry is proposed, which suppresses the influence of environment on measurement precision under long displacement range. An interference fringe measurement method is proposed, which combines the diffraction characteristics of the measuring grating with the phase-shifting algorithm. By controlling the direction, period and phase nonlinear errors of the interference fringe, high quality interference fringe can be obtained. Further, a dynamic phase-locking model is established by using heterodyne interferometry to compensate grating phase error caused by stage motion error in real time. A grating with the aperture of 1500 mm × 420 mm is fabricated. The wavefront aberration reaches 0.327λ @ 632.8 nm and the wavefront gradient reaches 16.444 nm/cm. This research presents a novel technique ...