Atomic surface of fused silica with high material removal rate produced by novel chemical mechanical polishing using composite rare earth oxides

作者：Xinting Chen, Xinting Chen, Zhenyu Zhang, Leilei Chen, Xiaofei Yang, Bingfeng Ju, Weiting Liu, Xingqiao Deng, Mengyi Wang, Yongsong Xu · 发表于：Colloids and Surfaces A Physicochemical and Engineering Aspects · 年份：2025 · DOI：10.1016/j.colsurfa.2025.136420 · 被引用次数：10 · 研究领域：Advanced Surface Polishing Techniques、Diamond and Carbon-based Materials Research、Semiconductor materials and devices