Atomistic mechanisms of SiC electrochemical mechanical polishing in aqueous H2O2: A ReaxFF molecular dynamics study

作者：Rui Zhu, Tianyu Zhang, Qingyu Yao, Yang Peng, Feng Cheng, Zirui Wang, Yongguang Wang, Xiaolong Lu, C.M. Wang, Yongwu Zhao · 发表于：Journal of Manufacturing Processes · 年份：2025 · DOI：10.1016/j.jmapro.2025.01.053 · 被引用次数：29 · 研究领域：Advanced Surface Polishing Techniques、Advanced ceramic materials synthesis、Semiconductor materials and devices