Atomic-scale material removal and deformation mechanism in nanoscratching GaN

作者：Zhao Jun, Wuqian Li, Shiwei Chen, Yeshen Lan, Marian Wiercigroch, Zixuan Wang, Ji Zhao · 发表于：International Journal of Mechanical Sciences · 年份：2024 · DOI：10.1016/j.ijmecsci.2024.109804 · 被引用次数：53 · 研究领域：Metal and Thin Film Mechanics、Advanced Surface Polishing Techniques、Semiconductor materials and devices