Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

作者：Chengzhao Luo, Yanhui Ding, Zhenwei Ren, Chenglong Wu, Yonghuan Huo, Xin Yu Zhou, Zhiyong Zheng, Xinwen Wang, Yu Chen · 发表于：Light Science & Applications · 年份：2024 · DOI：10.1038/s41377-024-01601-3 · 被引用次数：29 · 研究领域：Quantum Dots Synthesis And Properties、Perovskite Materials and Applications、Chalcogenide Semiconductor Thin Films

Abstract The high pixel resolution is emerging as one of the key parameters for the next-generation displays. Despite the development of various quantum dot (QD) patterning techniques, achieving ultrahigh-resolution (>10,000 pixels per inch (PPI)) and high-fidelity QD patterns is still a tough challenge that needs to be addressed urgently. Here, we propose a novel and effective approach of orthogonal electric field-induced template-assisted dielectric electrophoretic deposition to successfully achieve one of the highest pixel resolutions of 23090 (PPI) with a high fidelity of up to 99%. Meanwhile, the proposed strategy is compatible with the preparation of QD pixels based on perovskite CsPbBr 3 and conventional CdSe QDs, exhibiting a wide applicability for QD pixel fabrication. Notably, we further demonstrate the great value of our approach to achieve efficiently electroluminescent QD pixels with a peak external quantum efficiency of 16.5%. Consequently, this work provides a general approach for realizing ultrahigh-resolution and high-fidelity patterns based on various QDs and a novel method for fabricating QD-patterned devices with high performance.