The effect of amino acid addition in CeO2-based slurry on SiO2/Si3N4 CMP: Removal rate selectivity, morphology, and mechanism research

作者：Xinyu Han, Shihao Zhang, Renhao Liu, Fangyuan Wang, Baimei Tan, Xinyu Zhao, Jiadong Zhao, Yunhui Shi · 发表于：Journal of Molecular Liquids · 年份：2024 · DOI：10.1016/j.molliq.2024.125855 · 被引用次数：30 · 研究领域：Advanced Surface Polishing Techniques、Advanced ceramic materials synthesis、Metal Extraction and Bioleaching