Research progress of quantum dot photolithography patterning and direct photolithography application

作者：Zhong Chen, Yu Li, Zhongwei Man, Aiwei Tang · 发表于：Nano Research · 年份：2024 · DOI：10.1007/s12274-024-6896-7 · 被引用次数：26 · 研究领域：Quantum Dots Synthesis And Properties、Nanowire Synthesis and Applications、Nanofabrication and Lithography Techniques

For the new display technology based on quantum dots (QDs), realizing high-precision arrays of red, green, and blue (RGB) pixels has been a significant research focus at present, aimed at achieving high-quality and high-resolution image displays. However, challenges such as material stability and the variability of process environments complicate the assurance of quality in high-precision patterns. The novel optical patterning technology, exemplified by direct photolithography, is considered a highly promising approach for achieving submicron-level, hyperfine patterning. On the technological level, this method produces patterned quantum dot light-emitting films through a photochemical reaction. Here, we provide a comprehensive review of various methods of QD photolithography patterning, including traditional photolithography, lift off, and direct photolithography, which mainly focused on direct photolithography. This review covers the classification of direct photolithography technologies, summarizes the latest research progress, and discusses future perspectives on the advancement of photolithography technology de-masking.