Advances in MXene-based technologies for the remediation of toxic phenols: A comprehensive review

作者：Muhammad Naveed Afridi, Zulakha Zafar, Imtiaz Afzal Khan, Imran Ali, Aziz-Ur-Rahim Bacha, Hubdar Ali Maitlo, Muhammad Qasim, Muhammad Nawaz, Fei Qi, Mika Sillanpää, Kang Hoon Lee, Muhammad Bilal Asif · 发表于：Advances in Colloid and Interface Science · 年份：2024 · DOI：10.1016/j.cis.2024.103250 · 被引用次数：52 · 研究领域：MXene and MAX Phase Materials、Advanced Photocatalysis Techniques、Graphene and Nanomaterials Applications

The pressing global issue of organic pollutants, particularly phenolic compounds derived primarily from industrial wastes, poses a significant threat to the environment. Although progress has been made in the development of low-cost materials for phenolic compound removal, their effectiveness remains limited. Thus, there is an urgent need for novel technologies to comprehensively address this issue. In this context, MXenes, known for their exceptional physicochemical properties, have emerged as highly promising candidates for the remediation of phenolic pollutants. This review aims to provide a comprehensive and critical evaluation of MXene-based technologies for the removal of phenolic pollutants, focusing on the following key aspects: (1) The classification and categorization of phenolic pollutants, highlighting their adverse environmental impacts, and emphasizing the crucial need for their removal. (2) An in-depth discussion on the synthesis methods and properties of MXene-based composites, emphasizing their suitability for environmental remediation. (3) A detailed analysis of MXene-based adsorption, catalysis, photocatalysis, and hybrid processes, showcasing current advancements in MXene modification and functionalization to enhance removal efficiency. (4) A thorough examination of the removal mechanisms and stability of MXene-based technologies, elucidating their operating conditions and stability in pollutant removal scenarios. (5) Finally, this review concludes by outl...