A revisit from CVD kinetics to CVD reactor: Investigating uniform growth mechanism of polysilicon in a reduction furnace

作者：Wei Si, Ning Wang, Yuan Zong, Gance Dai, Fanzheng Meng, Zuodong Yang, Ling Zhao, Zhong Xin, Guangjing Jiang · 发表于：Chemical Engineering Science · 年份：2024 · DOI：10.1016/j.ces.2024.120162 · 被引用次数：10 · 研究领域：Silicon and Solar Cell Technologies、Metallurgical Processes and Thermodynamics、Silicon Carbide Semiconductor Technologies