Ultrahigh Photoresponsivity of W/Graphene/β-Ga2O3 Schottky Barrier Deep Ultraviolet Photodiodes

作者：Madani Labed, Bo‐In Park, Jekyung Kim, Jekyung Kim, Jang Hyeok Park, Ji Young Min, Hee Jae Hwang, Jeehwan Kim, Jeehwan Kim, You Seung Rim · 发表于：ACS Nano · 年份：2024 · DOI：10.1021/acsnano.3c12415 · 被引用次数：60 · 研究领域：Ga2O3 and related materials、Advanced Photocatalysis Techniques、ZnO doping and properties

The integration of graphene with semiconductor materials has been studied for developing advanced electronic and optoelectronic devices. Here, we propose ultrahigh photoresponsivity of β-Ga 2 O 3 photodiodes with a graphene monolayer inserted in a W Schottky contact. After inserting the graphene monolayer, we found a reduction in the leakage current and ideality factor. The Schottky barrier height was also shown to be about 0.53 eV, which is close to an ideal value. This was attributed to a decrease in the interfacial state density and the strong suppression of metal Fermi-level pinning. Based on a W/graphene/β-Ga 2 O 3 structure, the responsivity and external quantum efficiency reached 14.49 A/W and 7044%, respectively. These values were over 100 times greater than those of the W contact alone. The rise and delay times of the W/graphene/β-Ga 2 O 3 Schottky barrier photodiodes significantly decreased to 139 and 200 ms, respectively, compared to those obtained without a graphene interlayer (2000 and 3000 ms). In addition, the W/graphene/β-Ga 2 O 3 Schottky barrier photodiode was highly stable, even at 150 °C.