Tuning the electronic structure and Schottky barrier by NbX2 contact to MXY (M=Mo, W; (X≠Y) S, Se, Te) monolayer

作者：Umair Khan, Basit Ali, Hamid Ullah, M. Idrees, Chương V. Nguyen, B. Amin · 发表于：Micro and Nanostructures · 年份：2024 · DOI：10.1016/j.micrna.2024.207765 · 被引用次数：8 · 研究领域：2D Materials and Applications、MXene and MAX Phase Materials、Semiconductor materials and interfaces