The role of ammonium citrate and dodecyl pyridinium chloride on chemical mechanical polishing relevant to SiO2 dielectric layer

作者：Xianglong Zhang, Ni Meng, Xianghui Li, Xukun Mei, Luyao Yang, Yangang He · 发表于：Journal of Manufacturing Processes · 年份：2023 · DOI：10.1016/j.jmapro.2023.10.054 · 被引用次数：24 · 研究领域：Advanced Surface Polishing Techniques、Diamond and Carbon-based Materials Research、Advanced machining processes and optimization