H 2 S-removing UiO-66 MOFs for sensitized antibacterial therapy

作者：Shaohu Huo, Qianhui Xie, Min Zhang, Zitong Jiang, Ling Fu, Wenhong Li, Chenrong Bian, Kaile Wu, Yulin Zhu, Xuan Nie, Shenggang Ding · 发表于：Journal of Materials Chemistry B · 年份：2023 · DOI：10.1039/d3tb00552f · 被引用次数：12 · 研究领域：Metal-Organic Frameworks: Synthesis and Applications、Sulfur Compounds in Biology、Nanoplatforms for cancer theranostics

skin wound healing experiment confirmed that Gm@UiO-66-MA could greatly reduce the risk of bacterial reinfection and accelerate wound healing. Overall, Gm@UiO-66-MA offers a promising antibiotic sensitizer for minimizing bacterial resistance and a therapeutic strategy for tolerant bacteria-related refractory infections.