Impact of oxygen content on phase constitution and ferroelectric behavior of hafnium oxide thin films deposited by reactive high-power impulse magnetron sputtering

作者：Samantha T. Jaszewski, Eric R. Hoglund, Anna Costine, Marc H. Weber, Shelby S. Fields, Maria Gabriela Sales, Jaykumar Vaidya, Leah Bellcase, Katie Loughlin, Alejandro Salanova, Diane A. Dickie, Steven L. Wolfley, Michael David Henry, Jon‐Paul Maria, Jacob L. Jones, Nikhil Shukla, Stephen McDonnell, Petra Reinke, Patrick E. Hopkins, James M. Howe, Jon F. Ihlefeld · 发表于：Acta Materialia · 年份：2022 · DOI：10.1016/j.actamat.2022.118220 · 被引用次数：50 · 研究领域：Ferroelectric and Negative Capacitance Devices、Semiconductor materials and devices、MXene and MAX Phase Materials