Excellent diffusion barrier property of amorphous NbMoTaW medium entropy alloy thin films used in Cu/Si Connect System

作者：Kun Hu, Qiang Hu, Xiandong Xu, S.H. Chen, Jiang Ma, Wanqing Dong · 发表于：Vacuum · 年份：2022 · DOI：10.1016/j.vacuum.2022.111195 · 被引用次数：20 · 研究领域：High Entropy Alloys Studies、High-Temperature Coating Behaviors、Advanced materials and composites