The overview of 2013 CAD contest at ICCAD

作者：Iris Hui-Ru Jiang, Zhuo Li, Hwei-Tseng Wang, Natarajan Viswanathan · 年份：2013 · DOI：10.1109/iccad.2013.6691128 · 被引用次数：5 · 研究领域：Advancements in Photolithography Techniques、3D IC and TSV technologies、Advanced Surface Polishing Techniques

Contests and their benchmarks have become an important driving force to push our EDA domain forward in different areas lately, such as ISPD, TAU, DAC contests. The annual CAD Contest in Taiwan has been held for 13 consecutive years and has successfully boosted the EDA research momentum in Taiwan. To encourage better research development on timely and practical EDA problems across all domains, CAD Contest is internationalized since 2012 under the joint sponsorship of the IEEE CEDA and Ministry of Education (MOE) of Taiwan. 2012 CAD Contest attracted 56 teams from 7 regions, including USA, Japan, Mainland China, Hong Kong, Korea, Italy, and Taiwan. Continuing its great success in 2012, 2013 CAD contest attracts 87 teams from 9 regions, including USA, Canada, Brazil, India, Russia, Japan, Mainland China, Hong Kong and Taiwan, achieving 55% growth. Three contest problems on technology mapping, placement, and mask optimization are announced this year and run by industry experts from Cadence and IBM. Topic chair Hwei-Tseng Wang of Cadence Design Systems manages the first contest problem, concentrating on technology mapping for macro blocks. The implementation of a digital function is more flexible and powerful as technology advances. Therefore, how to fully utilize and reuse macro blocks in a highly optimized design becomes an important issue. However, it is challenging to identify the boundaries of macro blocks in such complex netlists. For the first problem, contestants are requi...