Protocol for growing silica nanowires on various substrates to enhance superwetting and self-jumping properties

作者：Jiann Shieh, Guan Fu Huang, Jing Yuan Tsai, Bo Huang, Yu Fang Huang · 发表于：STAR Protocols · 年份：2021 · DOI：10.1016/j.xpro.2021.101066 · 被引用次数：6 · 研究领域：Fluid Dynamics and Thin Films、Photonic Crystals and Applications、Surface Modification and Superhydrophobicity

The protocol outlines the steps for growing silica nanowires on various substrates such as glass and stainless-steel foil. Silica nanowires are grown by thermal chemical vapor deposition via a vapor-liquid-solid mechanism, in which silicon wafers are used as silicon sources and platinum films as catalysts. This protocol can be used to grow silica nanowires on other substrates such as quartz filter, quartz sphere, alumina plate, and silicon wafer, provided the substrate materials can tolerate the temperature during process heating. For complete details on the use and execution of this profile, please refer to Lee et al. (2019), Tsai and Shieh (2019), and Tsai et al. (2021).