Effect of Cu doping on the secondary electron yield of carbon films on Ag-plated aluminum alloy

作者：Tiancun Hu, Shukai Zhu, Yanan Zhao, Xuan Sun, H. J. Yang, Yun He, Xinbo Wang, Chunjiang Bai, He Bai, Huan Wei, Meng Cao, Zhongqiang Hu, Ming Liu, Wanzhao Cui · 发表于：Chinese Physics B · 年份：2021 · DOI：10.1088/1674-1056/ac322c · 被引用次数：5 · 研究领域：Diamond and Carbon-based Materials Research、Semiconductor materials and devices、Silicon Carbide Semiconductor Technologies

Reducing the secondary electron yield (SEY) of Ag-plated aluminum alloy is important for high-power microwave components. In this work, Cu doped carbon films are prepared and the secondary electron emission characteristics are studied systematically. The secondary electron coefficient δ max of carbon films increases with the Cu contents increasing at first, and then decreases to 1.53 at a high doping ratio of 0.645. From the viewpoint of surface structure, the higher the content of Cu is, the rougher the surface is, since more cluster particles appear on the surface due to the small solid solubility of Cu in the amorphous carbon network. However, from viewpoint of the electronic structure, the reduction of the sp 2 hybrid bonds will increase the SEY effect as the content of Cu increases, due to the decreasing probability of collision with free electrons. Thus, the two mechanisms would compete and coexist to affect the SEY characteristics in Cu doped carbon films.