Large‐Area Synthesis of Superclean Graphene via Selective Etching of Amorphous Carbon with Carbon Dioxide

作者：Jincan Zhang, Kaicheng Jia, Li Lin, Wei Zhao, Huy Ta Quang, Luzhao Sun, Tianran Li, Zhenzhu Li, Xiaoting Liu, Liming Zheng, Ruiwen Xue, Jing Gao, Zhengtang Luo, Mark H. Rümmeli, Qinghong Yuan, Hailin Peng, Zhongfan Liu · 发表于：Angewandte Chemie International Edition · 年份：2019 · DOI：10.1002/anie.201905672 · 被引用次数：88 · 研究领域：Graphene research and applications、Carbon Nanotubes in Composites、Supercapacitor Materials and Fabrication

Abstract Contamination commonly observed on the graphene surface is detrimental to its excellent properties and strongly hinders its application. It is still a great challenge to produce large‐area clean graphene film in a low‐cost manner. Herein, we demonstrate a facile and scalable chemical vapor deposition approach to synthesize meter‐sized samples of superclean graphene with an average cleanness of 99 %, relying on the weak oxidizing ability of CO2 to etch away the intrinsic contamination, i.e., amorphous carbon. Remarkably, the elimination of amorphous carbon enables a significant reduction of polymer residues in the transfer of graphene films and the fabrication of graphene‐based devices and promises strongly enhanced electrical and optical properties of graphene. The facile synthesis of large‐area superclean graphene would open the pathway for both fundamental research and industrial applications of graphene, where a clean surface is highly needed.