Effects of substrate bias and temperature on the structure and dielectric properties of Ti Zr1−N ternary nitride thin films

作者：Yujing Ran, Huiping Lu, Shujun Zhao, Liuwei Jia, Yinglan Li, Zhaotan Jiang, Zhi Wang · 发表于：Surface and Coatings Technology · 年份：2018 · DOI：10.1016/j.surfcoat.2018.12.023 · 被引用次数：19 · 研究领域：Metal and Thin Film Mechanics、GaN-based semiconductor devices and materials、ZnO doping and properties