Controlled chemical etching leads to efficient silicon–bismuth interface for photoelectrochemical CO2 reduction to formate

作者：Pan Ding, Yiqi Hu, Jun Deng, J. Chen, Chenyang Zha, Hui Yang, N. Han, Qiufang Gong, L. Li, T. Wang, Xiaodong Zhao, Yanguang Li · 发表于：Materials Today Chemistry · 年份：2018 · DOI：10.1016/j.mtchem.2018.10.009 · 被引用次数：41 · 研究领域：CO2 Reduction Techniques and Catalysts、Advanced Photocatalysis Techniques、Electronic and Structural Properties of Oxides