Structural and dielectric properties of ion beam deposited titanium oxynitride thin films

作者：Liuwei Jia, Huiping Lu, Yujing Ran, Shujun Zhao, Haonan Liu, Yinglan Li, Zhaotan Jiang, Zhi Wang · 发表于：Journal of Materials Science · 年份：2018 · DOI：10.1007/s10853-018-2923-y · 被引用次数：16 · 研究领域：Semiconductor materials and devices、ZnO doping and properties、Metal and Thin Film Mechanics