Impact of Chloride Ions on UV/H 2 O 2 and UV/Persulfate Advanced Oxidation Processes

作者：Weiqiu Zhang, Shiqing Zhou, Julong Sun, Xiaoyang Meng, Jinming Luo, Dandan Zhou, John C. Crittenden · 发表于：Environmental Science & Technology · 年份：2018 · DOI：10.1021/acs.est.8b01662 · 被引用次数：275 · 研究领域：Advanced oxidation water treatment、Water Treatment and Disinfection、Water Quality Monitoring and Analysis

Chloride ion (Cl – ) is one of the most common anions in the aqueous environment. A mathematical model was developed to determine and quantify the impact of Cl – on the oxidization rate of organic compounds at the beginning stage of the UV/persulfate (PS) and UV/H 2 O 2 processes. We examined two cases for the UV/PS process: (1) when the target organic compounds react only with sulfate radicals, the ratio of the destruction rate of the target organic compound when Cl – is present to the rate when Cl – is not present (designated as r R Cl – / r R ) is no larger than 1.942%; and (2) when the target organic compounds can react with sulfate radicals, hydroxyl radicals and chlorine radicals, r R Cl – / r R, can be no larger than 60%. Hence, Cl – significantly reduces the organic destruction rate in the UV/PS process. In the UV/H 2 O 2 process, we found that Cl – has a negligible effect on the organic-contaminant oxidation rate. Our simulation results agree with the experimental results very well. Accordingly, our mathematical model is a reliable method for determining whether Cl – will adversely impact organic compounds destruction by the UV/PS and UV/H 2 O 2 processes.