Fermi Level Pinning at Electrical Metal Contacts of Monolayer Molybdenum Dichalcogenides

作者：Chang Sik Kim, Inyong Moon, Daeyeong Lee, Min Sup Choi, Faisal Ahmed, Seung‐Geol Nam, Yeonchoo Cho, Hyeon‐Jin Shin, Seongjun Park, Won Jong Yoo · 发表于：ACS Nano · 年份：2017 · DOI：10.1021/acsnano.6b07159 · 被引用次数：963 · 研究领域：2D Materials and Applications、Graphene research and applications、MXene and MAX Phase Materials

Electrical metal contacts to two-dimensional (2D) semiconducting transition metal dichalcogenides (TMDCs) are found to be the key bottleneck to the realization of high device performance due to strong Fermi level pinning and high contact resistances ( R c ). Until now, Fermi level pinning of monolayer TMDCs has been reported only theoretically, although that of bulk TMDCs has been reported experimentally. Here, we report the experimental study on Fermi level pinning of monolayer MoS 2 and MoTe 2 by interpreting the thermionic emission results. We also quantitatively compared our results with the theoretical simulation results of the monolayer structure as well as the experimental results of the bulk structure. We measured the pinning factor S to be 0.11 and −0.07 for monolayer MoS 2 and MoTe 2, respectively, suggesting a much stronger Fermi level pinning effect, a Schottky barrier height (SBH) lower than that by theoretical prediction, and interestingly similar pinning energy levels between monolayer and bulk MoS 2 . Our results further imply that metal work functions have very little influence on contact properties of 2D-material-based devices. Moreover, we found that R c is exponentially proportional to SBH, and these processing parameters can be controlled sensitively upon chemical doping into the 2D materials. These findings provide a practical guideline for depinning Fermi level at the 2D interfaces so that polarity control of TMDC-based semiconductors can be achieved ef...