Application of x-ray fluorescence spectrometry in characterization of high-k ultra-thin films

作者：Chunlan Zhao, Bert Brijs, Fabian Dortu, S. DeGendt, Matty Caymax, Marc Heyns, W.F.A. Besling, JW Maes · 年份：2003 · 被引用次数：1 · 研究领域：Copper Interconnects and Reliability、Advancements in Photolithography Techniques、Semiconductor materials and devices