Direct Measurement of Dirac Point Energy at the Graphene/Oxide Interface

作者：Kun Xu, Caifu Zeng, Qin Zhang, Rusen Yan, Peide D. Ye, Kang Wang, Alan Seabaugh, Huili Grace Xing, John S. Suehle, Curt A. Richter, David J. Gundlach, N. V. Nguyen · 发表于：Nano Letters · 年份：2012 · DOI：10.1021/nl303669w · 被引用次数：74 · 研究领域：Graphene research and applications、Quantum and electron transport phenomena、Topological Materials and Phenomena

We report the direct measurement of the Dirac point, the Fermi level, and the work function of graphene by performing internal photoemission measurements on a graphene/SiO(2)/Si structure with a unique optical-cavity enhanced test structure. A complete electronic band alignment at the graphene/SiO(2)/Si interfaces is accurately established. The observation of enhanced photoemission from a one-atom thick graphene layer was possible by taking advantage of the constructive optical interference in the SiO(2) cavity. The photoemission yield was found to follow the well-known linear density-of-states dispersion in the vicinity of the Dirac point. At the flat band condition, the Fermi level was extracted and found to reside 3.3 eV ± 0.05 eV below the bottom of the SiO(2) conduction band. When combined with the shift of the Fermi level from the Dirac point, we are able to ascertain the position of the Dirac point at 3.6 eV ± 0.05 eV with respect to the bottom of the SiO(2) conduction band edge, yielding a work function of 4.5 eV ± 0.05 eV which is in an excellent agreement with theory. The accurate determination of the work function of graphene is of significant importance to the engineering of graphene-based devices, and the measurement technique we have advanced in this Letter will have significant impact on numerous applications for emerging graphene-like 2-dimensional material systems.