Fabrication of 200 nm Period Hard X-ray Phase Gratings

作者：Houxun Miao, Andrew A. Gomella, Nicholas Chedid, Lei Chen, Han Wen · 发表于：Nano Letters · 年份：2014 · DOI：10.1021/nl5009713 · 被引用次数：39 · 研究领域：Advanced X-ray Imaging Techniques、Crystallography and Radiation Phenomena、High-pressure geophysics and materials

Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments.