WD40‐REPEAT 5a functions in drought stress tolerance by regulating nitric oxide accumulation in Arabidopsis

作者：Wen‐Cheng Liu, Yunhui Li, Hongmei Yuan, Binglei Zhang, Shuang Zhai, Ying‐Tang Lu · 发表于：Plant Cell & Environment · 年份：2016 · DOI：10.1111/pce.12723 · 被引用次数：52 · 研究领域：Plant Stress Responses and Tolerance、Photosynthetic Processes and Mechanisms、Plant nutrient uptake and metabolism

Abstract Nitric oxide (NO) generation by NO synthase (NOS) in guard cells plays a vital role in stomatal closure for adaptive plant response to drought stress. However, the mechanism underlying the regulation of NOS activity in plants is unclear. Here, by screening yeast deletion mutants with decreased NO accumulation and NOS‐like activity when subjected to H 2 O 2 stress, we identified TUP1 as a novel regulator of NOS‐like activity in yeast. Arabidopsis WD40‐REPEAT 5a ( WDR5a ), a homolog of yeast TUP1, complemented H 2 O 2 ‐induced NO accumulation of a yeast mutant Δ tup1 , suggesting the conserved role of WDR5a in regulating NO accumulation and NOS‐like activity. This note was further confirmed by using an Arabidopsis RNAi line wdr5a‐1 and two T‐DNA insertion mutants of WDR5a with reduced WDR5a expression, in which both H 2 O 2 ‐induced NO accumulation and stomatal closure were repressed. This was because H 2 O 2 ‐induced NOS‐like activity was inhibited in the mutants compared with that of the wild type. Furthermore, these wdr5a mutants were more sensitive to drought stress as they had reduced stomatal closure and decreased expression of drought‐related genes. Together, our results revealed that WDR5a functions as a novel factor to modulate NOS‐like activity for changes of NO accumulation and stomatal closure in drought stress tolerance.