Two-Photon Diffraction and Quantum Lithography

作者：Milena D’Angelo, Maria V. Chekhova, Yanhua Shih · 发表于：Physical Review Letters · 年份：2001 · DOI：10.1103/physrevlett.87.013602 · 被引用次数：665 · 研究领域：Random lasers and scattering media、Quantum Information and Cryptography、Quantum Mechanics and Applications

We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.