High Throughput, High Yield Fabrication of High Quantum Efficiency Back-illuminated Photon Counting, Far UV, UV, and Visible Detector Arrays

作者：Shouleh Nikzad, Michael E. Hoenk, Alexander G. Carver, Todd J. Jones, Frank Greer, Erika Hamden, T. Goodsall · 发表于：IISS online library · 年份：2024 · DOI：10.60928/w1gn-dxe5 · 被引用次数：8 · 研究领域：Photocathodes and Microchannel Plates、CCD and CMOS Imaging Sensors、Ga2O3 and related materials

This paper discusses the high throughput end-to-end post fabrication processing of high performance delta-doped and superlattice-doped silicon imagers for UV, visible, and NIR applications, presenting results on far ultraviolet and ultraviolet quantum efficiency (QE) in a photon counting, detector array. Improvements in QE by nearly an order of magnitude over microchannel plates (MCPs) are achieved through precision interface band engineering of Molecular Beam Epitaxy (MBE) and Atomic Layer Deposition (ALD).