Effects of substrate temperatures on the structure and properties of hafnium dioxide films

作者：Hongfei Jiao, Xinbin Cheng, Jiangtao Lu, Ganghua Bao, Yongli Liu, Bin Ma, Pengfei He, Zhanshan Wang · 发表于：Applied Optics · 年份：2011 · DOI：10.1364/ao.50.00c309 · 被引用次数：23 · 研究领域：Semiconductor materials and devices、Integrated Circuits and Semiconductor Failure Analysis、Nanowire Synthesis and Applications

Different HfO2 monolayers under different deposition conditions, such as substrate temperature and oxygen partial pressure, were prepared from metal hafnium using the reactive electron beam evaporation method. X-ray diffraction was applied to determine the crystalline phase of these films, the surface morphology of the samples was examined by atomic force microscopy, and the optical properties were analyzed using a spectrophotometer and the surface thermal lens technique. The relationship between substrate temperature and film characteristic was investigated, and the correlation between the observed film properties and the laser damage threshold was also discussed.