Fabrication of Nano-Grating by Focused Ion Beam / Scanning Electron Microscopy Dual-Beam System

作者：Bao Yin Yao, Hu Luo, Li Shuang Feng, Zhen Zhou, Rongming Wang, Yuan Yuan Chi · 发表于：Key engineering materials · 年份：2011 · DOI：10.4028/www.scientific.net/kem.483.66 · 被引用次数：3 · 研究领域：Nanofabrication and Lithography Techniques、Force Microscopy Techniques and Applications、Advanced Surface Polishing Techniques

The uniform, well designed nano-gratings have been successfully fabricated by using a dual beam focused ion beam (FIB)/scanning electron microscopy (SEM) system on the silicon substrates coated with 15 nm thick Au layer. The nano-gratings were designed with period of 840 nm, groove of 425 nm and beam of 415 nm. By adjusting the FIB parameters of milling like beam current, dwell time and scanning model, the fabricated nano-gratings were uniform in width and the side wall had good verticality. The currently fabricated nano-gratings using focused ion beam can be adjusted to serve as sub-wavelength optical resonant sensor which can be extended to nano-grating accelerometer with resolution of 10 -9 g.